Used TOPCON WM 3 #9115730 for sale

TOPCON WM 3 is a mask & wafer inspection equipment designed to detect and inspect defects on both glass and chrome-on-quartz planarizing masks and wafers. The system is designed to provide high-precision, high-throughput and cost-effectiveness in mask and wafer inspection operations. It utilizes a 4K CCD Colour Camera and a Digital Input/Output Unit, detecting potential defects at high resolution on up to 200mm and 300mm wafers. TOPCON WM-3 machine is powered by its incorporated Optical Design Engine, which is able to quickly and accurately detect potential defects on the mask and wafer. The tool also provides both high resolution digital cameras and optically-corrected lenses for inspection. The mask and wafer inspection asset can acquire extremely accurate images from both mask and wafer surfaces. Moreover, the inspection model also offers a wide range of features such as automatic pattern recognition, defect detection and report, multi-zone tracking, image pre-processing, thresholding, and TWAIN interface. WM 3 equipment is capable of simulate ambient light conditions, addressable via an adjustable light system that can be calibrated according to the application. The adjustable light unit prevents any optical adjustments or manual re-alignment to compensate for the ambient light. WM-3 machine also offers a variety of automatic detection options for mask and wafer inspection, such as standard hot spot detection, line edge roughness measurement, and a search and report function for detecting small defects. The tool also supports a variety of command languages, allowing for rapid and efficient mask and wafer inspection. It can be also connected to a host computer, allowing the asset to apply automated control and data transfer. Additionally, TOPCON WM 3 model offers several software options, such as the Wafer Inspection Control and Analysis Software Package, allowing for efficient and effective management of the data generated by the equipment. Overall, TOPCON WM-3 is a state-of-the-art mask and wafer inspection system designed for industry-leading accuracy, speed, and cost-effectiveness. The unit is feature-rich and provides users with a wide range of capabilities to efficiently and effectively detect and inspect potential defects on both masks and wafers.