Used TROPEL FlatMaster FM200 #9115976 for sale

TROPEL FlatMaster FM200 is an advanced mask and wafer inspection equipment designed to provide precise, high-resolution images of the most challenging arrays across a wide range of substrates. It combines advanced optics and imaging technology to achieve superior accuracy and repeatability with 1 micron resolution. The system includes a 300x300mm stage to accommodate a variety of substrates including 4 to 8-inch wafers and various masked plates. The automated 15x objective lenses precisely focus from 2mm to 200mm and provide up to 80x magnification. The advanced CMOS sensor delivers up to 106MP resolution and allows for higher accuracy with less magnification. FlatMaster FM200 is a versatile, user-friendly unit that allows all types of mask and wafer inspections. It can detect even single-pixel defects or pixel-to-pixel variations of colour and brightness. It has the ability to automatically detect multiple classes of defects, including particles, striations, scratches, surface texture, corrosion, crystal structure, plating, moisture, leakage and mask alignment errors. It has the ability to define false positives that can be tuned and calibrated. The machine includes a suite of protection features to ensure optimum performance, including off-axis illumination, uniform UV illumination, polarization of the illumination, advanced optical filters and advanced thermal management. It is also equipped with software features that ensure accurate imaging, such as edge detection, auto focus, noise reduction, colour correction, flat field correction, enhanced quality control and printable reports. TROPEL FlatMaster FM200 also offers a variety of user-friendly interface tools, allowing operators to customize setting parameters and save profiles for different inspections. The tool also includes features that help to provide a continuous workflow, such as automated exception reports and the ability to generate high-magnification images for detailed analysis and further classification of defects. The asset also offers a range of advanced features for automated mask and wafer defect detection and analysis. Advanced algorithms are used to accurately identify, classify and quantify defects. In addition, a comprehensive suite of advanced analysis tools allows for data extraction and analysis from various image sources. Activity logs and machine profiles facilitate maintaining historical records and efficient management of tool performance.