Used VISTEC LWM9000 #293589506 for sale

VISTEC LWM9000 is a comprehensive mask and wafer inspection equipment designed for automated analysis of photomasks or large wafers for both production and laboratory environments. With its innovative optical head design, LWM9000 mask and wafer inspection system is capable of delivering resolution up to 0.35 microns, allowing for detailed analysis and measurements of critical features. The unit features advanced imaging technology for identifying defects, distortions, and other anomalies in both mask and wafer surfaces. VISTEC LWM9000 is equipped with three optical sensors— CD-SEM (scanning electron microscopy), CD-AFM (atomic force microscopy), and hierarchical single-atom metrology—which can collectively assess the mask and wafer pattern with high accuracy. For CD-SEM imaging, the device is capable of obtaining images in three different magnifications, ranging from 0.25 to 0.35 microns. The CD-AFM feature provides fast and accurate measurements of thin films, conductor structures, and semiconductor layers. The hierarchical single-atom metrology feature allows users to detect the smallest possible structures on structures with more than ninety percent accuracy. LWM9000 offers scalable, user-defined photomask modalities and includes an intuitive, graphical user interface. This enables quick and accurate measurements and integration of customer-specific simulation and mask layout data. The device also offers automated stage control for quick focus positioning, allowing for fast and efficient analysis of large or segmented data sets. It features automatic motion versatility, allowing for multiple positioning and continuous scanning of the mask or wafer, even in-plane or across multiple planes. VISTEC LWM9000 has a powerful yet easy-to-use software for both users and developers. The software provides a versatile and user-friendly environment for both production and laboratory inspection, allowing users to customize the machine and executing automatic alignment checks and acquisitions. It also offers expert annotation, patch analysis, as well as advanced script commands and batch processing capabilities, thus providing efficient and accurate operation. Additionally, the device has an integrated database which allows users to store, retrieve and compare mask and wafer data. In conclusion, LWM9000 is an advanced inspection tool designed with the latest imaging and metrology technologies. It is an excellent choice for both production and laboratory uses, offering advanced imaging capabilities and automation for rapid and accurate analysis of photomasks or wafers. The device is also highly user-friendly, allowing for customization and expert analysis of large or segmented datasets.