Used VISTEC LWM9000 #293593050 for sale

ID: 293593050
Wafer Size: 6"
Vintage: 2005
CD Measurement system, 6" 2005 vintage.
VISTEC LWM9000 mask and wafer inspection equipment is an automated, automated optical inspection system designed for the semiconductor industry. The unit is capable of inspecting a variety of objects including photomasks, reticles, wafers, and other semiconductor-related components. The inspection machine uses a sophisticated optical imaging platform and advanced algorithms to detect any type of defects. The core of LWM9000 tool is its high-quality optical inspection platform. The platform uses advanced optics, including a near-infrared laser and a high-resolution digital imaging asset. This setup allows for an exceptionally clear image of the mask or wafer. The optical imaging platform also includes optics to ensure low-noise measurements and to reduce the time needed to detect defects. VISTEC LWM9000 also features a number of advanced algorithms to detect defects. These algorithms are tailored to the specifics of the task and the inspected objects, so that the model can quickly detect the most common types of defects including vias, pits, undersize and oversize defects, and misalignment. The user interface of LWM9000 is designed for easy use. The interface appears as a touchscreen display with a number of different settings and options to choose from. This allows for users to customize the equipment for their particular application. In addition to its automated inspection capabilities, VISTEC LWM9000 also comes with advanced statistical analysis software. This software can be used to automatically generate summaries and reports on the detected defects and can be used in combination with the other features of the system. This software is also capable of establishing the type of defects found, as well as their quantity so that corrective action can be taken more quickly. LWM9000 is a powerful unit that is capable of swiftly inspecting photomasks and wafers. Its high-quality optical imaging platform and advanced algorithms are capable of detecting a variety of defects quickly and accurately. The improved user interface allows for easy setup and use, while the statistical analysis software is capable of providing detailed reports on the inspected objects.
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