Used WELCH Allyn 767 #171008 for sale

WELCH Allyn 767 is an automatic mask & wafer inspection equipment that offers users an efficient and precise way of inspecting both wafer and mask structures. The system utilizes 2D and 3D structured illumination technology that is designed to detect defects in ICs, MEMS, and sensor structures at the 0.18 μm node. The 767 unit features a high performance lighting subsystem and high-resolution microscopy optics which allow the user to detect defects that may be present on the wafer and mask structure. Additionally, the 767 has an automated, non-contact alignment machine that helps maximize tool efficiency, as well as an auto-correction process that adjusts intensity or focus to match changing conditions. This mask and wafer inspection asset also includes a full range of powerful image analysis and defect review tools. These tools are used to detect various types of defects and irregularities, such as cracks, pattern errors, and dust contamination, among others. The user can then analyse the images and take action to repair the defects. The 767 model boasts a user friendly interface that helps users quickly evaluate images and make corrections, as well as the ability to save inspection and measurement results for review at a later time. Additionally, at the end of the inspection process, the equipment will generate detailed reports about the inspected sample. Overall, Allyn 767 is an advanced mask & wafer inspection system that users can depend on to inspect both wafer and mask structures accurately and precisely. It provides a comprehensive set of defect inspection and analysis tools that can be used to detect and correct a variety of defects. The 767's user friendly interface and detailed reports make the unit and inspection process even more efficient and accurate.