Used XENOGEN IVIS 200 #141433 for sale

XENOGEN IVIS 200 is a mask and wafer inspection equipment designed for production-level semiconductor fabrication and materials characterizations. It features a distortionless optical, stage-mounted top-down imaging system capable of providing up to 200x magnification. The unit's zoom optics support measurements of high aspect ratios, very small critical dimensions, and ultra-low defect levels. Additionally, IVIS 200 integrates the latest imaging technology and automated process control into a single easy-to-use machine. XENOGEN IVIS 200 features a full-field measurement range of up to 200 mm with a normal field size of 50 mm. Its high-resolution LED illumination also allows for sharp definition and uniformity of images across the entire field. IVIS 200 can capture images at resolutions as high as 50 nanometers, easily resolving both defects and finer structures. The tool supports a wide range of imaging modes, including brightfield, darkfield, edge detection, oblique illumination, and optics replication. XENOGEN IVIS 200 also incorporates advanced image-processing software, which helps in the identification and measurement of manufacturer-specified patterned defects. The asset can automatically recognize these defects, allowing it to be used in automatic test programs. In addition, IVIS 200 includes a robust automation model, which provides support for multiple-stage process control, throughput optimization, and dynamic fault detection. This automation capability reduces manufacturing costs and increases yield and throughput. Finally, XENOGEN IVIS 200 comes with a comprehensive set of advanced software features for improving measurement accuracy and control. These features include image capture profiles, image recognition settings, data analysis statistics, automated process control, and reporting functions. The software can be configured to provide customized results which can be used for quality control and improvement purposes. The user interface is intuitive and highly configurable, and the equipment is compatible with a variety of language options, including English, Chinese, Japanese, and Korean. In summary, IVIS 200 is an advanced mask and wafer inspection system designed to improve semiconductor fabrication and materials characterizations. It features a distortionless optical, stage-mounted top-down imaging unit capable of capturing images at resolutions as high as 50 nanometers. It also includes advanced image processing software and robust automation capabilities for optimizing throughput and detecting faults. This machine can help improve quality control and increase efficiency in semiconductor production.