Used ZEISS AIMS 193 #9095595 for sale

ZEISS AIMS 193 Mask & Wafer Inspection Equipment is an automated multi-functional system designed to meet the demands of mask and wafer inspection and characterization. This unit combines the functionality of both optical and electrical metrology to facilitate fault detection and the characterization of semiconductor devices. The machine's key features are its high-performance imaging optics and imaging electronics, which are used to inspect and characterize wafers and masks at high magnifications. The tool allows for the observation of a wide variety of critical defects on masks and wafers with extremely high accuracy. The asset also provides the capability to measure various parameters including overlay alignment accuracy, process compatibility and electrical device performance. The optical imaging capabilities of the model are further enhanced by its powerful image processing algorithms. These algorithms enable the user to identify subtle defects on wafers and masks with a high level of accuracy. Additionally, the equipment includes powerful analytics and reporting functionalities which allow users to track, analyze and report on inspections and results. The system is highly configurable and user-friendly. Its robust construction ensures reliability in operation and its ergonomic design makes it comfortable to use. AIMS 193 Mask & Wafer Inspection Unit is a powerful and versatile tool for performing various mask and wafer inspection and characterization tasks. It provides accuracy, speed, and reliability for a variety of semiconductor applications.