Used ZEISS / HSEB ZML-200 #9249419 for sale

ZEISS / HSEB ZML-200 is an industry-leading mask & wafer inspection equipment that provides superior performance in the challenging area of semiconductor device fabrication. With up to 200 wafers per hour throughput, the system efficiently handles the inspection of high-volume production runs. HSEB ZML-200 utilizes a high-resolution CCD camera to scan each mask or wafer, searching for any defects that may have not been noticed in the process of manufacture. Utilizing a built-in defect detection algorithm and a customized user interface, the unit can quickly identify even the smallest defects in masks or wafers. The machine is also designed to be easy to use and fast-acting, allowing users to make quick and accurate diagnoses of the mask or wafer being inspected. To further improve the tool's speed and accuracy, the asset is outfitted with an advanced high-precision focus control model. This equipment quickly focuses on any features of the mask or wafer, allowing for fast point-to-point or area-to-area inspections. The system also features the ability to test multiple semiconductor device recipes in order to ensure maximum product yields. By monitoring a complex networks of metallic and insulating layers, the unit is able to detect a wide range of defects including line-width variations, shorts, opens, isolated defects, and overubbing. The machine also has a host of self-testing features, ensuring that any maintenance is properly completed. Finally, ZEISS ZML-200 is equipped with numerous software options that allow users to customize its operation. With the built-in defect analysis software, users can record and store data from the inspections. Additionally, the tool is outfitted with pattern recognition optimization software so the asset can constantly learn and modify its screening settings based on user input. In conclusion, ZML-200 is an industry-leading mask & wafer inspection model that is designed to maximize production yields, reduce costs, and reduce time spent on mask or wafer inspection. With top-of-the-line features such as high-resolution CCD imaging, a customized user interface, and cutting-edge defect analysis and pattern recognition optimization software, ZEISS / HSEB ZML-200 is the perfect choice for any semiconductor device fabrication facility.