Used ZEISS / HSEB ZML-200 #9249420 for sale

ZEISS / HSEB ZML-200 is a mask and wafer inspection equipment for precision mask and wafer inspection. It utilizes a unique gap between the optical elements and a flexure reticle to enable precise alignment and excellent image resolution. HSEB ZML-200 provides high speed and high resolution imaging with an industry-leading darkfield sensor module and a patented algorithms that enable it to detect and measure defects that are too small to be seen through other inspection systems. The system consists of a reticle, a darkfield imaging camera, and a light source. The reticle is made up of a central ring and two adjustable arms that are connected to an adjustable reticle holder. This allows the user to precisely configure the position of the inspection optics to ensure high-quality images. The darkfield imaging camera is equipped with an external CCD image sensor and an internal field-of-view allowing for wide-ranging view of the tested mask or wafer. This allows the unit to detect even the smallest defects. The light source is designed for maximum illumination by using a unique combination of fluorescent and UV illumination. This ensures uniform illumination across the entire area while delivering an even and optimal brightness. Additionally, a special digital imaging feature allows the machine to capture even the most intricate details such as defects that are below the human eye's threshold. ZEISS ZML-200 can inspect a variety of masks and wafers. It can be used for various inspection types such as photo masks, wafer, and critical-dimension (CD) measurements. The tool comes equipped with necessary software to assist the user in the inspection process and data collection. The asset is very easy to use with intuitive software interface, and its intuitive user interface allows for efficient analysis and interpretation of data. ZML-200 is an ideal tool for mask and wafer inspection. The model offers unbeatable accuracy, high speed and accurate imaging, and sophisticated algorithms for effective defect detection. Its intuitive user interface and advanced software tools make it a reliable and efficient tool for mask and wafer inspection.