Used ZEISS REG C #9386144 for sale

ZEISS REG C is a mask and wafer inspection equipment, capable of performing a range of automated tasks, including surface and embedded defect inspection, topography evaluation, and overlay metrology. The system combines advanced Motion Performance with High Resolution and High Sensitivity to effectively inspect mask and wafers with high resolution magnification and automated operation. The high resolution and high sensitivity of REG C makes it capable of detecting defects that have been missed by other inspection systems. With its automatic focus control, the unit is able to maintain a high quality of defect inspection, and the automated motion ensures that the machine can reach any desired area on the mask and wafer with high accuracy. ZEISS REG C is equipped with a software tool which automates the mask and wafer inspection process. The software provides tools for mask alignment, overlay measurements, and defect locating. By automating the inspection process, the operator can use the software to quickly assess the mask and wafer data, ensuring the highest quality of inspection. In addition, REG C is able to perform a wide range of surface analysis with the help of the field emission scanning electron microscope (FE-SEM) and the Scanning Thermal Microscope (STM). The FE-SEM is capable of simultaneously scanning an area with high resolution while the STM can provide a detailed analysis of the surface of a sample. This combination of high resolution and advanced surface analysis allows for an in-depth inspection of any sample. ZEISS REG C is a powerful tool for automated mask and wafer inspection. Its strong automated features, along with its high resolution and sensitivities, make it the perfect choice for any type of inspection. By combining advanced motion performance, high resolution and high sensitivity, REG C provides a reliable and cost effective solution for mask and wafer inspection.