Used ZYGO 6024-0314-01 #9293075 for sale

ZYGO 6024-0314-01 mask and wafer inspection equipment is a powerful and reliable imaging system designed to accurately analyze and inspect photomask and wafer surfaces. The unit combines advanced imaging capabilities with precise motion control and allows for accurate sample analysis at low to medium magnifications, with high-resolution imaging at higher magnifications. The machine provides fast acquisition and analysis of images of the wafer surface. It is designed to operate under high precision and accuracy, with a single-point repeatability tolerance of 5 microns. The tool also incorporates advanced imaging capabilities, with optically variable scan speeds, a 3-dimensional laser scan lift detection, and high-precision laser auto-focusing. In addition, the asset is equipped with integrated non-contact wafer handling capabilities and a 2-axis sample positioning model. The equipment is built into an ergonomic and durable platform that is designed to meet industry-standard safety requirements. The platform includes an automated system controller, allowing operators to quickly and easily set up the imaging unit and automate the inspection process. The machine also includes a wide variety of versatile software features, such as image auto-cropping, automated patch mask alignment, and simultaneous support for multiple types of inspection. The tool also offers a wide range of accessories to meet their customers' specific inspection requirements. These include auto-focusing objectives, stage adapters, multi-sample turrets, and a wide variety of specialized software modules. The asset also offers a wide variety of data capture and export capabilities, allowing users to quickly and easily store and transfer acquired images. The model can be connected to a variety of external controllers, such as CAD/CAM systems, allowing users to remotely view and manipulate images. The equipment also includes an intuitive graphical user interface, allowing users to easily program multiple inspection steps and view detailed procedure results. Overall, 6024-0314-01 mask and wafer inspection system is a powerful and reliable unit designed to provide accurate and precise sample analysis. Its advanced imaging capabilities, combined with precise motion control, provide users with the ability to quickly and easily detect even the smallest defects in photomask and wafer surfaces. The machine also offers a wide variety of accessories and data capture and export capabilities, making it well-suited for applications in the semiconductor and electronics industries.