Used ZYGO 6024-0380-01 #293647232 for sale

ZYGO 6024-0380-01 is a mask and wafer inspection equipment used to inspect and identify defects associated with semiconductor devices. It utilizes a dual laser system to create an interference pattern, allowing for the imaging of single, double, and multiple resist layers on the substrate. The interference pattern assists in the detection of common defects such as voids, particles, shorts, and other anomalies. The unit utilizes a programmable Stage, comprised of a high-precision stepper or a high-resolution precision linear motor, to inspect up to 160 wafers on a platter. Additionally, the programmable stage can be customized for the application of projecting images for the masks and the wafers. The machine employs a 66-bit color CCD camera, with 10X to 200X magnification, and a 700 band spectrograph, allowing it to capture various features with high accuracy. 6024-0380-01 is capable of working in several imaging modes, ranging from confocal, to wide angle, to near/far field. It utilizes pulse width modulation, in order to reach higher scan speeds, and the motorized height adjustment enables excellent performance on bumped, recessed, and elevated surfaces. Keeping the optics adjustable, without manual intervention, is a key feature of the tool. The software associated with the asset is equipped with image analysis capabilities, toolbox and mask generation, as well as wafer inspection. The image analysis tools can detect variations in shapes, particle and voids, as well as shorts and fringe lines. The model can work with a wide range of resist thickness, ranging from 20 nm to 10 μm. In terms of its reliability and durability, ZYGO 6024-0380-01 is designed for low downtime and easy calibration and maintenance. It uses replaceable, dust-tight filters, which prevent dust from getting into the object plane. Additionally, 6024-0380-01 is certified for EMI, FCC, and CE. In conclusion, ZYGO 6024-0380-01 mask and wafer inspection equipment offers a highly versatile and reliable way to inspect masks and wafers at the nanometer level, making it a great choice for production applications. It features a wide range of features and capabilities, allowing for an accurate and efficient inspection process.