Used ZYGO 7701C/E #9244741 for sale

ZYGO 7701C/E is a mask and wafer inspection equipment that provides a comprehensive solution for wafer fabrication and related processes. The system supports 2D, 3D, and profile measurements, and is capable of measuring wafer thickness, ellipticity, tilt, warpage, and other characteristics with nanometer resolution. It also supports backside and edge inspection modes. ZYGO 7701C/E consists of a main control unit that is connected to optical units for motion control and sensors for measurement. The machine includes an optical projection unit that illuminates the wafer and a camera tool to capture images. It also features a dynamic XY stage and a vertically driven stage designed for fast and precise object positioning. ZYGO 7701C/E offers an automated, nondestructive examination of optical masks to detect flaws in the design and manufacturing stages. It measures defect areas ranging from 0.5µm and delivers defect detection repeatability of 0.5µm or better. It features high-contrast imaging, with an optical asset that can detect defects on both transparent and opaque masks. ZYGO 7701C/E is designed for automatic inspection and large scale measurements of wafers, glass plates, and other surfaces. It can measure wafer diameter, flatness, and other irregularities of semiconductor wafers, photomasks, and display substrates. It uses adaptive optics to ensure accurate 3D measurements, and supports a wide variety of deformation analysis algorithms. The model also comes with ZYGO industry-leading defect detection and calibration equipment, allowing the user to quickly scan and analyze a full array of reticles. The defect detection system identifies line-width variations and shading effects to detect and report defects. The integrated calibration unit ensures the accuracy of the measurements by adjusting the machine's position, operating parameters, calibration constants, and other settings. ZYGO 7701C/E is an advanced tool that provides tool makers and production staff with a comprehensive solution for defect analysis. With its intuitive software interface, rugged and reliable design, and fast and accurate measurements, it is the ideal asset for optical inspection of masks, wafers, andother surfaces.