Used ZYGO F/3.3 #191694 for sale

ZYGO F/3.3 is a mask & wafer inspection equipment used to measure the shape accuracy and surface finish of masks and wafers for semiconductor manufacturing processes. The system is based on a non-contact laser interferometer technology to detect sub-nanometer-level surface anomalies. It is capable of capturing three-dimensional (3D) topographic maps of the surfaces of masks and wafers with nanometer-level resolution, making it ideal for measuring surface flatness and non-flat shapes in one step. The key features of ZYGO F/3.3 are its high accuracy and precision. It has an adjustable scanning range from 0.1 microns to 5 millimeters, and is able to measure the surface flatness down to sub-nanometer level accuracy. It is also capable of making repeatable measurements over multiple surface areas, and is able to detect subtle surface anomalies. The unit includes a 5-axis mechanical platform, which allows it to accommodate different shapes and sizes of masks and wafers. Additionally, ZYGO F/3.3 has a high-accuracy optical metrology machine that can measure the surface topography and flatness. ZYGO F/3.3 is a highly efficient inspection tool that can streamline the semiconductor manufacturing process. It features a high-speed scanning capability, which allows users to obtain results quickly and accurately. Its software can integrate the data into a single report that can be accessed in real-time. The asset can also be easily integrated into existing manufacturing process lines, enabling users to use the model with minimal disruption. In addition to its high accuracy and efficiency, ZYGO F/3.3 is also designed for ease-of-use. Its intuitive user interface allows users to set up the equipment quickly and easily. The system also includes a range of safety features that can be customized to suit the individual needs of the user. Its robust construction provides stability and reliability, making it highly durable and reliable. Overall, ZYGO F/3.3 is an advanced mask & wafer inspection unit that is capable of providing highly accurate inspection data at a high speed. Its user-friendly interface and robust construction make it ideal for use in semiconductor manufacturing processes. It has the ability to accurately detect surface anomalies on a nanometer level, and its high speed scanning and data integration capabilities make it an efficient machine for streamlining the manufacturing process.