Used ZYGO GPI LC #293747146 for sale

ZYGO GPI LC equipment is an advanced mask and wafer inspection system designed to detect defects in thin layers of photomasks and wafers. The unit uses a proprietary illumination and imaging technique to measure the characteristics of the thin layers, including defects, with high accuracy. The imaging and analysis process is based on the technique of Phase Contrast Interference (PCI), enabling the machine to accurately measure patterns down to 6nm with a minimum feature size as small as 0.2μm. The tool uses dual-camera optics and two sensor arrays to capture simultaneous images from two planes of view. This dual-imaging technology allows the asset to measure both lateral and longitudinal characteristics of the thin layers, including defects. The model utilizes a proprietary illumination source to provide 360° coverage of each thin layer, with both the specimen and the imaging stage moving to ensure that every single area of the thin layer is analyzed. ZYGO GPI-LC equipment is designed to be highly automated, providing an advanced featureset to enable operators to quickly identify, measure and analyze defects with minimal manual user input. The system is capable of detecting subtle defects and includes a wide range of customizable automated measurement and analysis options, such as image processing, pattern recognition and measurement area selection based upon nominal pattern location. The unit also offers advanced anti-aliasing algorithms to reduce fait artifacts, with built-in software for 3D trace measurement. The machine is designed to be easy to install and operate, and provides intuitive user interface controls that enable users to set up systems quickly and accurately. With its advanced features and multi-camera tool, GPI LC is a powerful, professional mask and wafer inspection asset, capable of detecting and measuring small variations in thin layers, with the highest degree of accuracy.