Used ZYGO GPI XP #293808773 for sale

Manufacturer
ZYGO
Model
GPI XP
ID: 293808773
Vintage: 2009
Interferometer Spatial sampling: 320 x 240 Pixels 5-Axis stage Laser: Type: Helium-neon Wavelength: 632.8 nm Maximum output power: <2 mW Output power at aperture: <1 mW Test beam diameter, 4" Coherence length: >100 m Optical: XP Zoom range: 6:1 XP Aperture focus: -800 mm +1200 mm Optical center line: 4.25" Operating environment: Temperature: 15°C to 30°C Rate of temperature change: <1.0°C/15 minutes Humidity: 5 to 95% DELL PC Hard Disk Drive (HDD) CD-ROM Floppy Disk Drive (FDD) Color monitor, 19" Power supply: 90-240 VAC, Single phase, 75 W, 50/60 Hz 2009 vintage.
ZYGO GPI XP is a mask and wafer inspection equipment designed to help ensure the highest quality products are produced in a factory or lab environment. It is capable of measuring large and small structures down to the nanometer scale, providing a powerful tool for production of semiconductor devices and other products. The system is a full-featured modular mask and wafer inspection unit and offers a wide range of capabilities. It is a precision tool that is capable of automated scanning and inspection of intricate patterns, such as nanometrically-scaled arbitrary geometries and multi-layer structures. Furthermore, its flexible design allows for easy integration and custom configuration of the modules. ZYGO GPIXP utilizes a proprietary advanced radiometric imaging and detection machine. This tool employs laser-metrology technology and proprietary software for the analysis of mask and wafer surface features. It performs rapid pattern and feature identification and classification, including the ability to detect both failures and design-rule violations. Additionally, the asset's photomask comparator feature allows for comparison of printed patterns from photomasks, wafers and reticles. This ensures that all features, such as lines, spaces, vias and contacts, are present, properly constructed, and in uniform alignment. GPI-XP is designed with the latest in-lens imaging that provides the highest magnification levels over optical and other microscopy methods, helping operators to produce unprecedented results with the greatest accuracy achievable. The model is also designed with a full suite of tilting, rotation and movement controls, so it can be calibrated precisely according to the operator's needs. The advanced automation capabilities of GPI XP deliver enhanced reliability and reproducibility of results, reducing setup time while providing a greater level of confidence in the accuracy of the results. These automation capabilities can be achieved through the equipment's advanced software package, as well as through optional hardware modules. The hardware modules provide unique features, such as automatic wafer alignment and image stitching, which can aid in the rapid analysis of features too small to be accurately measured using normal detection methods. Overall, ZYGO GPI-XP provides an invaluable tool for ensuring quality products are produced. Its accuracy, flexibility and easy integration make it an ideal choice for mask and wafer inspection.
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