Used ZYGO Mark II #184338 for sale

ZYGO Mark II
Manufacturer
ZYGO
Model
Mark II
ID: 184338
Wafer Size: 6"
Interferometer with IntelliWave software Dell OptiPlex 160L w/P4 @ 2.66Ghz Windows XP-Pro OS 80GB HDD (12GB used), 500MB RAM 14" monitor Zygo Aperture Converter, 4" to 6" Zygo Lambda/20 Transmission flat, 6".
ZYGO Mark II is an advanced automated mask and wafer inspection equipment for detecting yields, lithographic defects and general conformance issues. This high-end mask and wafer inspection system provides wafer owners and mask makers with a fast and efficient way to identify and quantify manufacturing defects as well as assess yield impact. The unit is comprised of a laser beam and scan head assembly, precision XY and Tilt stages, a color digital video CCD detector and a variety of software modules. The laser module is designed to provide consistent aiming accuracy with minimized calibration time. The XY and Tilt stages provide precise alignment and adjustable scan rates up to 11,200 mm/s. The CCD detector provides clear images at resolutions up to 21,400 dpi. Mark II software package maintains an extensive library of defect analysis information. It user-friendly interface and intuitive menus allow quick access to multiple defect databases, as well as a variety of by-design measurements. This software also facilitates comprehensive specifications and reports generation. Due to its powerful combination of hardware and software capabilities, ZYGO Mark II machine offers superior inspection results. Its advanced algorithms allow for accurate and reliable defect detection, with the ability to identify variations that can be easily missed by human operators. The tool offers high-precision visibility through its superior spatial and temporal resolution. In terms of ease of use, the asset is intuitive and user-friendly, allowing for simplified setup and fast measurement cycles. All in all, Mark II inspection model provides a powerful, intuitive and cost-effective solution to mask and wafer inspection challenges. Its superior accuracy, high reliability and flexible software support enable rapid defect analysis without sacrificing quality. It is the perfect choice for industrial and research facilities needing a top-of-the-line mask and wafer inspection equipment.
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