Used ZYGO Mark II #76460 for sale
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ID: 76460
Interferometer
Zoom: 1x - 6x
Remote control for zoom and focus
Aperture: 4" (102mm)
Line voltage: 120 V or 230 V
SONY XC-ST51CE
Vertical: 50 Hz
Horizontal: 15625 Hz
Not included:
IntelliWave software from engineering synthesis design
4" Transmission flat
4" Return flat
Video monitor
Computer analysis.
ZYGO Mark II is a mask and wafer inspection equipment which is used for the inspection of semiconductor wafers and masks. It is a combination of optical, physical, and electrical technology. The system consists of a scanning microscope, an optical laser interferometer, and a visual inspection module. The scanning microscope is used to detect surface defects in the specimen. The optical laser interferometer is used to measure the critical parameters of the specimen such as the dimensions, surface flatness, and surface curvature. The visual inspection module is used to inspect the alignment, surface, and microstructure of the specimen. The microscope's optical components are designed to provide a high resolution image. The laser interferometers are used to measure vertical and lateral positions, as well as height variation across the surface of the specimen. The unit also has a digital encoder, which is used to measure distance, speed, temperature, and position. Mark II machine is able to detect a wide range of surface defects such as particulate contaminants, pinholes, and voids, as well as more subtle defects such as surface roughness and defect size distribution. With its digital imaging software, the tool can quickly generate large numbers of images for analysis and comparison. The asset can also detect abnormalities in the electrical behavior of the specimen, such as increased resistance or the presence of shorts. This allows for the detection of defects during the electrical testing of the specimen. ZYGO Mark II model is also able to measure a wide range of mechanical stresses, such as surface strain, stress gradients, fracture toughness, and plasticity. It can measure stress concentrations, as well as the strain energy of the specimen. The equipment is designed to be fully automated and to run in a production process. The control interface allows the user to program, execute, and monitor the operation of the system. It can be used to set up the unit for a specific application, or to run multiple operations in a series. Mark II is a leading edge mask and wafer inspection machine, which combines optical, physical, and electrical technology to provide a comprehensive solution for semiconductor fabrication. Its versatile features allow for fast and accurate inspection of a wide range of semiconductor wafers and masks, making it an ideal tool for the reliability and quality assurance of complex semiconductor structures.
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