Used ZYGO NewView 100 #85137 for sale

ZYGO NewViewTM ZYGO NewView 100 Mask and Wafer Inspection equipment is a high resolution, optical microscopy based imaging solution designed to inspect every element of semiconductor photomasks and wafers. It features a large, 5-axis motorized imaging table with a precision alignment and wafer staging system that ensures accuracy and repeatability. The NewViewTM ZYGO 100 also includes an intuitive user interface and automated inspection and defect identification software, ensuring fast and efficient results. The unit has a 45 degree angle view microscope, with 1.2μ lateral resolution. It has a maximum magnification of 2000X, and a fast digital imaging machine that utilizes a 24-bit color CMOS camera. The automated image capture and analysis capabilities of the device allow it to rapidly and accurately identify any defects on a photomask or wafer. It is also capable of detecting clear defects in a single exposure, and can identify complex defects that require stitching together several images from the same wafer. The NewViewTM NEWVIEW100 features a built-in 4 megapixel Digital Optical Sensing (DOS) tool for non-contact optical metrology measurements. This allows for the comprehensive and accurate analysis of mask or wafer geometries, as well as defect identification across a wide range of visual and structural features. It even has the ability to measure layer uniformity and chronicle edge integrity in 0.1 nm resolution. This video-based inspection asset is designed for quick defect isolation and analysis. The model can be used for defect detection, defect characterization, mask-to-mask comparison, and automated analyses of process flows. Additionally, it can be employed to assess photolithography performance, line edge roughness and pattern fidelity of photomasks and wafers during manufacture. ZYGO NewViewTM NewView 100 is a high-performance imaging and metrology equipment providing exceptional performance and accurate results. The user friendly interface, automated defect identification and intuitive analysis capabilities of the system ensure fast and efficient semiconductor mask and wafer inspection.