Used ZYGO NewView 6300 #9188823 for sale

ZYGO NewView 6300 Wafer and Mask Inspection equipment is an automated, non-contact optical metrology system designed for fast and accurate measurement of device features on wafers and masks. It combines high-resolution imaging with scanning tunable laser interferometry microscopy (STILI), making it suitable for a variety of semiconductor, opto-electronic, and opto-mechanical manufacturing measurements. ZYGO NEW VIEW 6300 has an automated stage, which enables it to precisely scan and measure large areas on wafers or masks. The advanced optics provide resolution up to 0.1 microns, enabling the measurement of extremely small features and structures. With a working distance of 8 mm and a field-of-view up to 25 mm, NewView 6300 can accurately measure device features on a wafer or mask in less than a minute. NEW VIEW 6300 is equipped with STILI technology, which enables the measurement of features with precision and accuracy. STILI uses laser interferometry to measure the smallest of topographical features, allowing the user to measure profile, slope, height, and other surface features with extreme accuracy. It also has the capability to measure through different layers of thin-film deposition, such as thin-film stacks or optical coatings. ZYGO NewView 6300 also offers a number of inspection modes for different applications. It can be used to measure device features with high accuracy in processes such as photoresist imaging, planarization, lithography, or deposition. It can also be used for electrode lift-off, mask defect analysis, and wafer thinning. The unit is easy to use and setup, and requires minimal operator training. It is equipped with a graphical user interface, which allows the user to set up and run the machine quickly and without error. Furthermore, ZYGO NEW VIEW 6300 is highly reliable and precise. It is able to achieve repeatability of 5nm or better for feature measurements, and is suitable for a variety of application needs. It also has the capability to measure multiple types of surface features as well as a variety of different features, including oxidation, deposition, and resistivity characteristics. NewView 6300 is an efficient tool for accurate wafer and mask inspection, providing unparalleled speed and accuracy. With its easy user interface and high-resolution optics, it is a great choice for any manufacturing process requiring precision mask and wafer measurement.