Used ZYGO NewView Maxim GP #156895 for sale

ZYGO NewView Maxim GP is a comprehensive mask and wafer inspection equipment designed to meet the exacting requirements of the semiconductor industry. The system is designed to measure rapidly changing parameters of a mask or wafer sample in a high-throughput environment. The unit is built around a powerful laser interferometer and a digital imaging machine, both of which can be precisely controlled and easily calibrated. The laser interferometer evaluates a sample's three-dimensional microstructures by measuring the difference in height between points on the sample. This allows for the accurate measurement of critical characteristics such as line width and pattern fidelity over a wide range of sample sizes. The digital imaging component of the tool then uses color-coded overlays to evaluate other properties, such as energy absorption and light transmittance. The asset includes a variety of settings to optimize the inspection process for different classes of samples. These include adjustments for the angle of incidence, beam magnification, and depth of focus. Additionally, the user can adjust the degree of intensity or correlation required for a given sample. ZYGO MAXIM GP includes advanced software tools to analyze the data collected from each inspection. The software makes it easy to compare results across different types of samples, processes, and instruments. It also has sophisticated analytics tools, such as FFT and overlays, that allow operators to quickly identify flaws on a sample. The model is designed with an emphasis on safety and convenience. A protective enclosure shields operators from the laser/beam radiation and the safety of the equipment is regularly tested with interlocks and external sensors. All components of the machine are easy to access and can be quickly removed for maintenance or replacement. In addition, the system is designed to be fast and efficient, with an average scan time of under a minute. NewView Maxim GP is an advanced and comprehensive mask and wafer inspection unit that provides superior data accuracy and robust performance under high throughput conditions. Its advanced components provide superior imaging capabilities, allowing for the measurement of critical parameters of a sample quickly and precisely. Additionally, its optimized features, safety features, and ease of use make it the ideal choice for semiconductor industry professionals looking for rapid, accurate, and dependable inspection.