Used LEICA / VISTEC LMS 2020 #293628347 for sale

LEICA / VISTEC LMS 2020 is a fully automated mask & wafer inspection equipment suitable for process control in semiconductor fabrication processes. It employs advanced vision algorithms to provide high-resolution images of the masks and wafers. LEICA LMS 2020's high-speed imaging capabilities enable rapid processing of masks and wafers for inspection. It offers a wide selection of optics to suit the needs of different processes and provides powerful imaging capabilities built on its advanced vision technology. It is capable of addressing a wide range of mask & wafer inspection tasks, including feature and defect detection, dielectric analysis, critical dimension measurement, and pattern recognition. VISTEC LMS 2020 utilizes top-of-the-line hardware, with automated image capture and image processing functions, such as image mosaicing to provide a complete image of the mask and wafer, even at a large magnifications. The system incorporates defect review, automated classification and sorting functions that allow users to quickly and reliably process inspection results. The unit also provides advanced vision software platform, which allows for customization of inspection parameters and automated correction of defects. The software also enables users to develop custom inspection algorithms for their specific needs. To ensure highest imaging accuracy, LMS 2020 incorporates high precision autofocus and automated lens calibration processes. The machine also offers robust temperature control and dust proofing to ensure maximum throughput and image quality. LEICA / VISTEC LMS 2020 is a cost effective tool which can be used in both production and R&D environments. It is an ideal solution for semiconductor manufacturers, requiring high-performance and reliable inspection solutions. With its powerful imaging capabilities and advanced vision algorithms, LEICA LMS 2020 offers both cost savings and increased throughput.