Used LEICA / VISTEC LMS 2020 #293629350 for sale

LEICA / VISTEC LMS 2020 is an advanced mask and wafer inspection equipment designed to provide superior image quality and high throughput for automated wafer or mask scanning. The system utilizes a variety of features to optimize image quality, such as extremely high resolution optics, reliable and precise linear scanning capability, and superior illumination. LEICA LMS 2020 is designed for inspection of submicron geometries and those of smaller dimensions. The unit utilizes a dual detector configuration based on LEICA high-speed, next-generation beam-steering technology. A unique high-dynamic illumination machine maximizes depth of field and diffused illumination throughout the wafer or mask, consequently improving image quality and productivity. The advanced optics and sensor array allow for rapid acquisition of high-resolution images. VISTEC LMS 2020 is equipped with a high-precision achromatic lens that has a double lens element tool. This allows for correction of aberrations of larger magnifications resulting in superb image quality. The asset also comes with a flexible filter model allowing for selection of various image presets for various applications. This helps to further optimize image quality, contrast and brightness. The high sensitivity camera and the efficient illumination combined with multi-exposure control provide the user with accurate and reliable results for detection of the smallest geometries. The advanced architecture of LMS 2020 delivers superior throughput for high-speed scanning and data acquisition. The linear scanning option allows for scanning speeds up to 500 mm/second, and with the image stitching and advanced image post-processing algorithms, the equipment is capable of high-performance image registration and data acquisition. The user-friendly software interface ensures efficient operation, enhancing the convenience and reliability of the system. LEICA / VISTEC LMS 2020 is a powerful and reliable unit that provides superior image quality, assurance of reliable results and the convenience of high-speed operation. With its high-speed scanning, wide range of advanced imaging capabilities, flexible filter machine and user-friendly interface, LEICA LMS 2020 is an ideal tool for mask and wafer inspection in semiconductor industries.