Used VEECO / DEKTAK SXM 320 #9248820 for sale
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ID: 9248820
Wafer Size: 8"
Vintage: 1997
IBM Atomic force microscope, 8"
EQUIPE TECHNOLOGIES ATM-407 Handler system
Pre-aligner
Cables for controllers
SXM Control rack missing
1997 vintage.
VEECO / DEKTAK SXM 320 is a high precision profilometer microscope with a wide range of features which are designed to meet the demanding requirements of semiconductor manufacturers. It is a 3D surface metrology system that is specifically designed to measure the topography of advanced electromigration, thin film, and integrated circuit devices. VEECO SXM 320 is composed of a rotating vibrating sample stage with a distance ranging from 0 - 200 microns. Its advanced optics and precise three-dimensional scan capabilities allow for the accurate measurement of both planar surface samples and complex topographical features. The system utilizes a high-numerical-aperture objective lens and a laser light source for precise measurements. The laser light is focused onto the sample and the reflected light is collected by the same objective lens. This provides information about the surface topography of the sample. The system is capable of taking scans at various resolutions ranging from 0.001 - 25 µm and can support sample sizes up to 300 mm × 300 mm. Furthermore, it can measure any sample in three-dimensions, allowing users to switch between top and side view scans. DEKTAK SXM 320 has a maximum sampling rate of 0.8 Hz, a repeatability of 1.5 µm, and a maximum depth of field of 50 µm. SXM 320 is equipped with a software suite which allows for the analysis and manipulation of the acquired data. Features such as color maps, cross section analysis, averaging, and smoothing can be applied to the scans to facilitate analysis. Additionally, the software offers the ability to export the scanned data to a variety of formats. Overall, VEECO / DEKTAK SXM 320 is an advanced profilometer microscope designed for the demanding requirements of semiconductor manufacturers. Its fast scan speeds, wide range of scanning resolutions, and ability to perform measurements in three-dimensions make it an ideal tool for measuring the topography of advanced electromigration, thin film, and integrated circuit devices.
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