Used VEECO / DIGITAL INSTRUMENTS DUVx210 #9233961 for sale

ID: 9233961
Vintage: 2001
Atomic force profiler 2001 vintage.
VEECO / DIGITAL INSTRUMENTS DUVx210 is a Direct Imaging 2D Scanned/Steered Exposure Tool (DiSSET) which is a powerful tool for direct imaging of patterned substrates. The equipment enables direct imaging of photomasks and reticles at very high image resolutions suitable for modern semiconductor devices. The system utilizes photon assisted laser light to project an image onto the substrate. The highly flexible stage enables highly precise alignment and scanning, ensuring the highest resolution imaging, which is especially important for complex scaled devices. The unit also allows for a wide range of steerable parameters controlling both the speed and accuracy of the image projection. VEECO DUVx210 component of VEECO machine utilizes a Class 2 solid-state laser diode for wavelength control. The laser diode provides highly efficient light emission with a very narrow wavelength distribution and low noise ratio. The tool comes with a mid-band digital control asset for precise wavelength control. The stage of the model supports large scanning ranges, allowing for both low magnification and high-resolution imaging. The scanning range includes xy scan speed of up to 800mm per second and motor stages with 10nm repeatability. DIGITAL INSTRUMENTS DUVx210 equipment is also equipped with a powerful beam control system, providing users with the ability to precisely control the size, shape, and intensity of the light being projected onto the substrate. The unit includes an articulated angular assembly that provides full three-dimensional angular control of the light sources. The machine includes an integrated digital control tool for fast and accurate scanning of the beam. The operator interface provides users with access to a wide range of imaging environments and tools for precise control of the image projection. DUVx210 asset is designed for use in the advanced manufacturings industry, providing for the highest quality imaging, as well as precise control of the model parameters to ensure the best possible results. The equipment has been designed for use in applications ranging from semiconductor devices to displays and optics. The system is extremely reliable and easy to use, with built-in support for a wide range of software tools. The unit is also designed to be highly scalable in order to meet the needs of different users and applications. The machine provides users with an intuitive graphical user interface, enabling them to quickly and easily set up their imaging process according to their needs.
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