Used ACR (Other Wafer Processing) for sale

ACR, a leading manufacturer of semiconductor equipment, offers a range of other wafer processing equipment alongside their popular models like the 2400, AFS 36, and TEC-SEM. These additional systems exhibit similar functionalities, but with unique features and advantages designed to meet specific industry requirements. One such model is the ACR 2400, an advanced wafer processing system that provides precise chemical vapor deposition (CVD) and gas sensing capabilities. This system stands out for its high throughput, excellent material utilization, and superior control over deposition parameters, making it ideal for applications requiring thin film deposition. The AFS 36 is another notable wafer processing system from ACR, focusing on deep etching processes. It incorporates advanced plasma etching technology to achieve high etch rates, uniformity, and selectivity. This system is frequently used in the fabrication of MEMS and micro-optical devices, where precision etching is crucial. ACR's TEC-SEM wafer processing system combines thermal processing and scanning electron microscopy (SEM) capabilities. This unique system allows for in-situ sample observation and analysis during thermal treatments. It is commonly employed in semiconductor research and characterization, helping researchers study the effects of temperature on material properties. These examples highlight ACR's commitment to providing versatile wafer processing units that integrate cutting-edge technologies to address specific needs. Whether it is CVD for thin film deposition, plasma etching for precision etching, or in-situ observation during thermal treatments, ACR's wafer processing machines demonstrate reliability, precision, and adaptability to support diverse semiconductor manufacturing processes.