Used AGFA Palladio 30 #9223808 for sale

AGFA Palladio 30 is a revolutionary wafer processing equipment that is used to reduce cost and improve process efficiency. It utilizes advanced technologies to provide the best performance for industrial-scale semiconductor and MEMS processing applications. Its unique design reduces cycle time, reduces wastage, and improves controlled wafer process performance. Palladio 30's optimized chamber design is designed to optimize process recipes and reduce process loading and unloading steps. The patented chamber, built with an advanced temperature control system, preheats, cools and stabilizes the substrate between layers to minimize thermal run-off and improve uniformity. Its stainless steel frame helps control the process environment by reducing gas distribution leaks. Additionally, AGFA Palladio 30 uses a multi-zone wafer support unit, designed to reduce wobble when a recipe requires the substrate to be delivered close to the substrate platen. Palladio 30 offers high-precision positioning to increase process effectiveness. Its integrated auto-loading and motion machine positions the mass of the substrate dynamically along the six-axis motion platform, allowing easy set up of complex and intricate patterns. In addition, its Interactive Vision Tool (IVS) offers easy alignment and positioning of wafers and substrates with the chuck or substrate platen to ensure consistent loading and processing. Moreover, the asset is equipped with a high resolution wafer detector, which can detect the wafer's peripheral edge and shut off the process when positioning is not exact. More importantly, AGFA Palladio 30 is designed to optimize the process of recipe development. It offers real-time process monitoring, so that process adjustments can be made as needed, in order to minimize any unnecessary delay. Additionally, it has software capability to easily program up to 12 different recipes into the process chamber, then store them for future use. Overall, Palladio 30 is a reliable, advanced wafer processing model that offers superior performance for industrial wafer processing. It is designed to reduce cycle-time, reduce waste, and improve process performance, making it the most cost-effective solution for industrial-scale production.