Used AIT VRS-150 #293648369 for sale

AIT VRS-150 is a state-of-the-art wafer processing equipment designed to enable precision, highly controlled deposition and etching of thin films and ultra thin films on a variety of substrates. It is the ideal solution for a wide range of wet and dry, high-volume and low-volume wafer processing applications. VRS-150 is equipped with a full suite of automated, integrated process tools and advanced technologies, allowing users to achieve the highest level of process control and repeatability in the most challenging process environments. AIT VRS-150 features modular, advanced hardware, advanced software and process technology, and a variety of highly specified fabricated components. The system offers excellent uniformity and process control, providing users with a highly efficient unit for achieving desired results. The sophisticated hardware configuration ensures that the user can precisely manage their wafer processing. VRS-150 also features an advanced heating machine, advanced ablation and etching systems, chemical analysis systems, and other advanced process middleware for supporting automated process recipes. The tool is capable of performing a variety of thin-film deposition techniques such as sputtering, evaporation and atomic layer deposition (ALD). It can also be used to perform a variety of etching techniques such as reactive ion etching (RIE), chemical mechanical polishing (CMP), chemical etching, and various other wafer-processing tasks. AIT VRS-150 also provides users with advanced chemical analytics and process monitoring systems that provide process control and accuracy. This asset can be used to monitor and adjust the process parameters and verify the quality of the resulting thin films. The automated process recipes and process development mode on VRS-150 provide users with an easy-to-use process development tool. It also provides users with real-time process control, analytics, feedback control and data analysis. AIT VRS-150 provides users with a completely automated process capability for a variety of thin-film deposition techniques, and it offers users a unique combination of process sophistication, repeatability, and process control that is unmatched in the industry. In addition to its advanced features, VRS-150 is versatile and cost-effective, offering users a complete solution for their thin-film deposition needs. It is the ideal solution for all types of wafer processing applications, from a simple batch process to demanding continuous production runs.