Used AMSONIC EgaClean 4100 #9315323 for sale

AMSONIC EgaClean 4100
ID: 9315323
Vintage: 2007
Ultrasonic cleaning system 2007 vintage.
AMSONIC EgaClean 4100 is an advanced vacuum wafer processing system specifically designed to meet the needs of the semiconductor industry. It provides a comprehensive, efficient and reliable cleaning solution for the most challenging applications. EgaClean 4100 is powered by an advanced, four-channel Pulsed Plasma technology, delivering precise control over the cleaning process. Pulsed Plasma technology enables simultaneous control over multiple cleaning steps, resulting in a uniform, highly efficient process for high-accuracy and repeatable results. AMSONIC EgaClean 4100 enables both manual and automated wafer cleaning processes. The integrated pressure system provides consistent vacuum levels across all cleaning areas, while the advanced safety features help to prevent hazardous gas accumulation. For improved precision and repeatable results, EgaClean 4100 also features a patented spreader system and a unique floating applicator head. In addition, AMSONIC EgaClean 4100 comes equipped with an advanced graphic user interface featuring easy-to-understand instructions. A range of built-in functions provides real-time feedback on wafer cleaning status and progress. EgaClean 4100 is designed to accommodate a wide variety of substrates and wafer sizes. It supports a range of processes including etch, strip, clean, backside cleaning, post CMP cleaning, and wafer oxidation, as well as single wafer processing. It also offers a low operating cost, as well as a small footprint for a more efficient production line. AMSONIC EgaClean 4100 is an ideal choice for wafer processing in semiconductor fabrications and offers a reliable solution for a wide range of substrate cleaning needs. With its advanced Pulsed Plasma technology, intuitive user interface, and range of built-in functions, EgaClean 4100 provides a comprehensive, efficient, and reliable cleaning solution designed to deliver consistent, high-accuracy results, and improved throughput.
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