Used APL ADS-200 #9280974 for sale

APL ADS-200 is an advanced wafer processing equipment for epitaxial deposition used in state of the art research facilities and laboratories. Its design allows for high productivity and precise control for reproducible results. The system's main components are a deposition chamber, hotplate, pump and exhaust, and a wafer transport mechanism. The chamber is equipped with a heated edge unit and a mechanism for precise control of the deposition rate. The heating machine ensures uniform film deposition over both thick and thin wafers. The chamber temperature can be regulated over a wide range, allowing for precise tuning of the properties of the material being deposited. The exhaust tool is designed for maximum efficiency and minimum particle generation. The hotplate features an adjustable temperature range, enabling the preparation of uniform substrates for epitaxial deposition. It can also be used for post-deposition thermal treatments or the preparation of thin film tapes. The wafer transport asset enables automatic loading of wafers to the chamber. It is designed for high throughput and can hold up to 50 wafers at a time. The model is easy to use and allows for automation with a controller and software. The controller supports both manual and automatic operation. In manual mode, parameters such as deposition rate, temperature, and thickness can be set directly. In automatic mode, up to eight different recipes of compound and element deposition can be customised. This allows users to predetermine the characteristics of the film that they are planning on applying to a wafer. ADS-200 is a highly reliable and robust equipment designed for maximum performance in a range of research and laboratory settings. With its unparalleled control and precision over a wide range of factors, it is the ideal tool for advanced wafer processing tasks.