Used AQUEOUS TECH AQ 400CL #9234265 for sale

AQUEOUS TECH AQ 400CL is an advanced wafer processing equipment designed to meet the highest non-chemical particle reduction requirements of wafer fabrication. The system provides superior particle reduction performance, tighter particle size distribution control, and more efficient run times. AQUEOUS TECH AQ 400/CL features an adjustable pressure jet-nozzle cleaning process, which is designed to ensure optimal wafer coating results and particle reduction performance. This process utilizes a precise water flow rate along with adjustable jet-nozzle orientation and position to effectively clean both rough and finished surfaces. The combination of multiple jet-nozzle cleaning cycles with adjustable water pressure delivers advanced particle reduction performance. AQ 400CL also features a combination of both wet and dry process capabilities. This combination of both process capabilities makes cleaning wafer surfaces easier, and increases performance by allowing for the removal of fine particles while maintaining the integrity of the underlying wafer surface. AQ 400/CL unit utilizes high-intensity UV-C photoluminescent light particle-removal technology. This patented technology ensures robust particle reduction without the use of chemicals. The photoluminescent light exposes the wafer surfaces to a safe, precise energy flux, which neutralizes particles without damaging the underlying substrate. This technology also enables longer run times for more efficient processing of wafer surfaces. Additionally, AQUEOUS TECH AQ 400CL features a wide range of automation and machine controls to accommodate different applications, run speeds and environmental conditions. The software is designed to remove particles from the front preceding process, upstream of the wafer buildup room, and also in the post-processing area. This provides high-quality particle-reduced wafer surfaces in both the pre- and post-processing stages. Overall, AQUEOUS TECH AQ 400/CL is an advanced wafer processing tool designed to meet the highest non-chemical particle reduction requirements. The asset offers superior particle reduction performance, tighter particle size distribution control, more efficient run times, and a wide range of automation and model controls.