Used BARON BLAKESLEE MSR-120 #9399798 for sale

BARON BLAKESLEE MSR-120 wafer processing equipment is a fully automated, high-precision system designed for a variety of wafer processing applications. It is suitable for various wafer sizes and materials, including silicon, gallium arsenide, and other specialty materials. Utilizing a unique, patented etching process, the unit provides extremely precise etching performance, yielding high-quality dielectric layers within the substrate. MSR-120 features an array of advanced components and features, including: a CNC-controlled 300 mm/3µM saw/polarity wafer-handling robot, an integrated PC control, advanced monitoring technology, a real-time camera machine, fully automated process control, and multiple precision process chambers. The result is an automated wafer-processing tool that provides superior repeatability and process uniformity. The CNC-controlled saw/polarity handling robot is a unique feature of BARON BLAKESLEE MSR-120 asset. It enables the user to accurately position the wafer for precise etching processes. Its integrated PC control allows for the easy programming of research or production cycles. Its advanced monitoring technology monitors the wafer processing in real-time, allowing the user to monitor the process. MSR-120 comes with a real-time camera model that enables the user to observe wafer etching processes in real-time. This allows for greater control, accuracy, and uniformity of the etching process. The fully automated process control enables the user to set up and execute standard and custom production/research cycles. Multiple process chambers are provided, enabling the user to process several types of wafers simultaneously. The chambers are equipped with adjustable etch rates and operating temperature, allowing for greater accuracy and process control. These chambers are also fully insulated to ensure efficient operation and reduce energy costs. In summary, BARON BLAKESLEE MSR-120 wafer processing equipment is an extremely reliable, accurate, and efficient system that offers enhanced control and repeatability. Its unique saw/polarity wafer handling robot, fully automated process control, real-time camera unit, and multiple precision process chambers make it the ideal choice for wafer processing applications.