Used BENTELER tecWasher 10/2c #9219620 for sale
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ID: 9219620
Vintage: 2013
Horizontal glass-plate washing machine
Pre-spraying area top and bottom:
Includes: Tank & pump
(2) Washing-sections with cylindrical brushes
(2) Tanks with pumps and heating elements
(2) Pairs of air knifes
Water-guidance standard via cascade
Motor-driven adjusting of glass thickness via control panel
Short space saving design
Transport system drive (frequency controlled)
Fan with noise insulation
Automatic throttle flap
Air filter EU 5
Fan-platform
Infeed and exit conveyors
Maximum width of glass-plate: 1000 mm
Minimum width of glass-plate reference edge: 50 mm
Minimum length of glass-plate reference edge: 148 mm
Glass-plate thickness: 1.5-12 mm
Noise level: 80+2 dB (A)
Conveyor speed (depends on glass thickness): 3 - 13 m/min
RPM Brushes: 600 U/min
2013 vintage.
BENTELER tecWasher 10/2c is an advanced and innovative wafer processing equipment featuring washer and spin-dryer modules for cleaning and drying of wafers after processing. The system is designed for the semiconductor manufacturing industry and provide batch and inline processing for small and large wafers. The unit is equipped with Plasma & VaporPhaseTech® (PVPT) cleaning technology which offers superior cleaning performance for removing contaminants at low/intermediate temperatures. The PVPT technology removes particles, foreign material, and residue at temperatures between 40-60°C, ensuring safe operation without damaging wafers. This allows for wet and dry pre-treatment of wafer surfaces and is best suited for low cost operation in conjunction with optimized energy efficiency and short cycle times. BENTELER tecWasher 10/2c features two separate washers in a single housing, each with its own independent process chamber and PVPT cleaning capabilities. This not only allows simultaneous cleaning of both small and large wafers, but also increases the productivity of the machine. The optional inline spin-dryer module offers improved particle removal efficiency as well as a dryer cycle that can be tailored to suit specific wafer sizes. The tool's compact design with optional integrated process line control allows the integration into existing cleanroom environments. The touchscreens and PLC panel enable easy user control that can be programmed for specific process requirements. The integrated preventative maintenance cluster ensures the highest quality of cleaning by providing a dedicated "wash and spin-dry" service program which replaces consumables whenever necessary. Finally, a digital data logging asset stores all key operation parameters in a central database for secure access and monitoring. This allows for traceability and detailed analysis of process cycle performance, allowing further process optimization or diagnosis of operational issues. Overall, BENTELER tecWasher 10/2c is a powerful model for efficient wafer processing, offering superior cleaning performance, optimized process times, and efficient process line control. Its combination of features in a compact and integrated design make it optimal for semiconductor and wafer-related processing.
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