Used BRANSON 1510-MTH #9072707 for sale

BRANSON 1510-MTH is a wafer processing equipment designed for complex laboratory-scale photolithography processes. This wafer processor features a spectrally-selective irradiance filter, giving users complete control to fine-tune the spectrum of the light illuminating the wafer. 1510-MTH also includes an anti-reflective plate, which is ideal for making small photo structures. Additionally, the system is equipped with a telecentric and anamorphic optics unit, allowing extremely high resolution imaging. BRANSON 1510-MTH machine is used for a wide range of photolithography processes and applications. These include photoresist masking, contact printing, lift-off processes, deposited metal patterning, etching, plating, and bonding of wafers. Several different types of substrates can be processed using 1510-MTH, including glass, silicon, quartz, and other exotic materials such as sapphire, gallium nitride, and metallic films. BRANSON 1510-MTH tool boasts a number of unique features that enable high-precision photolithography processes. It has an integrated vision asset for precise registration and alignment of components, and a programmable temperature-controlled stage for precise and consistent substrate heating and cooling. The stage can be configured to suit various application requirements, including temperature profiles for thermal processing. The model also features a precision X-Y stage for precision positioning of the wafer. 1510-MTH equipment is designed to provide accurate feedback on the quality of the sample. It has a vision system for monitoring the status of the photolithography process, and a photo-film analysis package for analyzing the performance of the substrate. The integrated control unit allows users to precisely control the speed and accuracy of the imaging process, as well as to automatically compensate for deviations. In addition to being highly accurate and precise, BRANSON 1510-MTH machine also offers high speed and throughput. It is capable of scanning substrates at speeds up to 500 mm/sec, and features an automated process control tool that enables users to program and monitor the imaging of multiple wafers at once. Moreover, the asset offers an intuitive user interface with easy access to the key features and settings. Overall, 1510-MTH model is ideal for complex laboratory-scale photolithography processes. It offers precise control over the spectrum of light illuminating the wafer, and it features a range of components and features that make it ideal for a range of photolithography applications. The equipment's fast scanning speeds and automated process control can help users achieve high throughput, while its intuitive user interface ensures ease of use.