Used BRANSON 3510R-DTH #293627287 for sale

BRANSON 3510R-DTH is an advanced wet-chemical wafer processing equipment designed for micro-electronic cleaning applications. This system is ideal for back grinding, low k etch and SiNx stripping, die and wafer cleaning, surface preparation, and flip chip passivation. It features a revolutionary DTH (DeepTrack Heated) function, which uses a patented cyclonic technology to clean the entire substrate from edge-to-edge and top-to-bottom in unparalleled efficiency. 3510R-DTH is an upgradable unit with two thermal chambers, two vacuum chambers, and a closed loop chemical delivery machine. The 2 thermal chambers each hold up to 60 wafers and can withstand temperatures up to 400°C. This allows a wide variety of substrate materials to be processed, including Si, GaAs, InP and SOI. The tool is designed for optimal temperature-time profile control for each wafer during any thermal process. The 2 vacuum chambers have a large capacity of 400L, and can reach a pressure of <10-8 torr. This ensures maximum effusion from the chamber. The closed-loop chemical delivery asset is designed for complete control over the chemical used and the concentrations. This allows the user to regulate the specific chemistry needed for various processes with maximum efficiency. The DeepTrack Heated (DTH) feature utilizes the differential temperature profile during wafer processing, created by the thermal chambers. This creates a powerful cyclonic effect and ensures an even substrate coverage with no residue. This is ideal for low-k etch and back grinding applications. In addition, BRANSON 3510R-DTH comes with a customizable software package allowing the user to adjust process parameters quickly and easily. This software also allows for complete diagnostic control over the model and lets the user know the status of each wafer during processing. 3510R-DTH is one of the most advanced wet-chemical wafer processing systems on the market today. With its 2 thermal chambers, 2 vacuum chambers and revolutionary DTH feature, it offers unprecedented control and efficiency in cleaning, etching, and surface preparation. Its customizable software package provides quick and easy control over various process parameters, as well as complete diagnostic control over the equipment. This system is ideal for micro-electronic cleaning applications, and with its advanced features it is sure to revolutionize the industry.