Used BRANSON Benchmark #9304115 for sale
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BRANSON Benchmark is a specialized high-precision wet and dry etching equipment designed to provide exceptional performance in semiconductor and other wafer processing applications. This system is capable of delivering precise etching results and tough wafer substrates that are extremely durable and resistant to corrosion. Benchmark utilizes both a high-powered vacuum and electrical-assisted etching, resulting in highly optimized results. The vacuum etching process starts with the precise application of selected etch chemicals onto the wafer surface. This is done using precise timing and control parameters that are adjusted to achieve optimal performance levels. The wafer is then exposed to a vacuum environment, which causes the etch chemicals to be drawn up into the substrate, effectively changing its composition and allowing for a greater degree of control over the etching process. The vacuum etching process is highly accurate, allowing for very precise etching patterns to be generated. The electrical-assisted etching process is designed to improve the etch performance of BRANSON Benchmark unit. This process uses a combination of electrochemical and chemical bath etching techniques, resulting in a more efficient and controlled process. During this process, a uniform electrical field is applied to the wafer surface, causing the etch chemicals to migrate towards the desired pattern or feature. This process also results in greater control over the etching process, allowing for more accurate and consistent results. Benchmark is capable of handling a variety of substrates and materials, including metals, ceramics, plastics, glass, and many other types of materials. The machine can be used for a variety of applications, such as thick or thin film etching, corrosion testing, plating, deep etching processes, and more. BRANSON Benchmark also features a range of processing capabilities, including in-situ metrology, automated surface preparation, and advanced fault detection systems. Overall, Benchmark is an excellent choice for wet and dry etching applications in the semiconductor and other specialty industries. With its advanced vacuum and electrical-assisted etching processes, the tool can produce an extensive range of intricate and complex etching patterns with superior precision and repeatability. It is a highly reliable and robust etching asset, with an industry-proven track record of success.
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