Used BRANSONIC 3510J-MTH #9377403 for sale

BRANSONIC 3510J-MTH
ID: 9377403
Vintage: 2003
Ultrasonic cleaning machine 2003 vintage.
BRANSONIC 3510J-MTH is a high-performance wafer processing equipment designed for high-volume production environments. The system features a two-stage sequential process, with both bulk and single-wafer MTH (diffusion) operations in a single unit. The machine uses a two-stage diffusion tool in which initially an MTH precoat is applied to the wafers, followed by a high-energy deposition of the MTH material. This two-stage diffusion process results in high uniformity of the MTH layer, and significantly improved temperature uniformity during the MTH deposition. The asset also features large wafer handling capabilities, allowing for efficient material deposition on large wafers, and automated wafer transfer capabilities allowing for improved speed and throughput. The model is capable of efficiently processing wafers up to 300 mm in diameter, with a maximum wafer throughput of up to 1500 wafers per hour. The equipment features an advanced process control system, allowing for precise control of the MTH deposition process to achieve optimal results. It also features a variety of monitoring capabilities, allowing for real-time data collection from the wafers and the process, and real-time adjustments to the MTH deposition parameters if needed. The unit includes a robust design for quick and easy maintenance, minimizing downtime and maximizing efficiencies. This includes easy access to all components for quick replacement, and a modular design that allows for fast and easy reconfiguration. The machine also includes a comprehensive remote monitoring and control tool, allowing operators to remotely monitor and adjust the MTH deposition process to ensure optimal performance. Overall, 3510J-MTH is a high-performance, high-volume wafer processing asset designed to provide a reliable and efficient solution for MTH deposition in high-volume production environments. The model's unique two-stage diffusion process and advanced process control equipment provide high uniformity of the MTH layer, while its large wafer handling capabilities and automated wafer transfer capabilities provide improved speed and throughput. The system also features robust design and easy access components, providing quick and easy maintenance and minimizing downtime. Finally, the comprehensive remote monitoring and control unit allows operators to remotely monitor and adjust the MTH deposition process to achieve optimal performance.
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