Used ECD Mega Mole 20 #9011600 for sale

ECD Mega Mole 20 is a specialized wafer processing equipment designed to handle a wide range of wafer sizes up to 200mm. It is an automated system that is used in high-volume wafer production but also has the ability to be used for low-volume or prototyping applications. The unit is composed of four main components: a Wafer Handler, a Layout Toolbox, an Image Processor, and a Controller. The Wafer Handler is responsible for moving the wafers into and out of the processing machine. It is designed to be precise and efficient to ensure optimal quality results. The handler uses stepper motors to provide rapid and accurate positioning and can hold up to 50 wafers at a time. It is compatible with a variety of wafer types, such as gallium arsenide, silicon, III-V, and compound semiconductors. The Layout Toolbox is responsible for producing layout patterns. It is capable of performing up to five processes simultaneously, which includes photoresist coating, photoimage development, lift-off, etching, and stripping. This multiple-layer etching technique can be used to fabricate precise patterns, such as fine line widths and pitches, with high fidelity. The Image Processor is a vision tool that applies image analysis algorithms to verify the size and quality of the patterns created by the Layout Toolbox. Its sophisticated algorithms are designed to identify and classify defects in the wafer based on their size, shape, and location. It can also track process parameters in real time, ensuring quality parameters are maintained during production. The Controller is the brains of the asset. It provides an intuitive and easy-to-use interface to program and manage the processing model, as well as tune parameters to customize the results. It is also capable of storing recipe recipes to simplify subsequent runs, and complex operations such as multi-layer development can be defined with ease. In summary, Mega Mole 20 is a versatile wafer processing equipment that provides automated operation for high-volume production, as well as flexibility for low-volume or prototyping applications. Its precise movements and image analysis algorithms enable the fabrication of high-quality and complex patterns, and easy-to-use programming tools make it an ideal choice for businesses seeking a reliable wafer processing system.