Used GREATSENSE GS-AIR-10 #293670974 for sale

GREATSENSE GS-AIR-10
ID: 293670974
System Capacity: Down line and space: 7 μm Copper thickness/space: ≤ 1.2 Materials: Substrates: FR4, FR5, BT, PI, ABF Thickness of substrate: 30 µm 0-70 µm thickness of copper Efficiency: Copper thickness: 18 µm Defect size: 60x60 µm², 300x300 µm² Time (s): 45, 180 Connectivity: ORBOTECH CIMS Machvision YMZ AOI GREATSENSE AVI Informational functions: QR Code reading functions Reports MES Defect maps/heat maps Board size: 760x680 mm² Board thickness: 50-10000 µm Penetration to laminate: ≤ 10 µm Deviation from normal line width: ≤ ±15% Re-inspection magnification: 25X-275X Available with customer-specific automation functions Power supply: 220 V, 4.5 kW.
GREATSENSE GS-AIR-10 is a fully automated, precision wafer processing equipment designed for high throughput volume production processes. The system offers a range of features to improve overall throughput, efficiency, and reliability. GS-AIR-10 is capable of handling up to 10 wafers in a single processing cycle, allowing for high throughput production. Its intelligent, automated capabilities enable quick adaptation to new processes and products, eliminating manual intervention. The unit consists of two main components; the gantry robot wafer handler and the process chamber. The gantry robot wafer handler is a multi-axis robotic arm that provides a precise way for the handling of wafers in and out of the process chamber. The gantry robot can be set up with various configurations, for example, wafer size and orientation, to easily process different types of wafers. The process chamber allows temperatures up to 1000°C for annealing and sintering processes. It has an integral, low noise vacuum machine allowing adjustment to levels up to 10-2 Torr. The tool can be customized according to customer needs, with a choice of process-specific fixtures, wafer transfer components, blanket boxes, and more. GREATSENSE GS-AIR-10 is designed for maximum uptime and fault analysis. Its control asset features a realtime data logging function, allowing users to monitor model data and quickly identify and diagnose faults. Additionally, it has an advanced control equipment with user definable parameters, such as thermal break rates. It is also capable of automatic chamber pressure equalization for fast ramp down times to optimize throughput and increase productivity and repeatability. The system is designed with safety and environmental protection in mind and has an explosion-proof design for added safety assurance. GS-AIR-10 is the perfect solution for advanced semiconductor processes that require precision control of temperature, pressure, and a highly efficient unit for wafer handling. For added process control, the machine can be equipped with an automatic wafer position alignment tool to ensure accuracy. GREATSENSE GS-AIR-10 offers high throughput handling and reliable performance, making it the ideal choice for high-volume wafer processing.
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