Used KINETICS Megapure 6001 HC #9358271 for sale

KINETICS Megapure 6001 HC is an advanced wafer processing equipment designed to provide high throughput and superior performance in a fully automated, highly versatile configuration. The system includes a 12-inch High-Current Melt (HCCM) reactor with an advanced crystallization multi-nozzle crystal growth unit that allows for operation over a wide range of temperature ranges, from a maximum of 350°C to minimum of 300°C. In addition, a 12-inch high-current substrate and heated carrier stage carry up to three 12-inch substrates up to 20 KJ/m2. The 6001 HC also features an inline liquid delivery unit that provides precise delivery of the necessary seed stock, media, dopant, and thermal control fluids needed for complete process control. The sealed thermal chambers provide cleanliness during the process and are heated with a 450 watt, low-thermal diffusion heater. Additionally, the heated surface stage is equipped with a quick-locking machine that allows for rapid change and alignment of wafers and carriers. The tool also includes ultra-sensitive mass flow controllers (MFC) with 5-decimal resolution control for precise ultra-high temperature gas-flow, as well as multi-axis inertial force sensors. These sensors enable automatic temperature and speed control during crystal growth, allowing for faster and more accurate wafer processing and production of up to 500 wafers per hour. The 6001 HC is designed to provide superior performance in combination with a range of safety and environmental features. Human-machine interface (HMI) design and full integration with fab tools, process management, validation, and manufacturing execution systems enable ease of use in a production environment. A variety of additional specialty features, such as toxicity monitoring, filter and fluid replacement notification, and process variation monitoring, ensure a safe and efficient work environment.