Used LNI SCHMIDLIN NS Sirocco 5000 #94149 for sale

LNI SCHMIDLIN NS Sirocco 5000 is a wafer processing equipment designed to be used in a wide range of industrial and scientific applications. The system utilizes advanced technologies to provide accurate and precise control over the parameters of the wafer processing steps, while the use of vacuum-based processing capabilities allows for improved repeatability and efficient processing of high volumes of wafers. The unit is composed of several components, each of which contribute to the overall functioning of the machine. In particular, the Sirocco 5000 contains a temperature control tool, a temperature measuring unit, a process chamber, and a wafer tray for loading wafers. The control asset allows for manual and automated operation. For manual operation, the operator will be able to adjust the temperature, time, and pressure settings manually. For automated operation, the model is able to respond to set points programmed into it, safeguarding the user from any potential manual mistakes that may result in inaccurate results. The temperature measuring unit is integrated into the equipment and is used to monitor the temperature during the processing procedures. The unit reads the temperature of the process chamber and is able to make precise temperature adjustments as needed in order to maintain an optimal level of temperature. The process chamber is the vessel in which the processing is done. The chamber is usually composed of quartz, allowing the passage of infrared radiation, and is capable of sustaining temperatures up to 600°C. The chamber contains several ports, each of which is designed to hold a different size wafer, allowing for simultaneous processing of different sizes of wafers. Finally, the wafer tray is used to load, unload, and transfer wafers. The wafer trays are made of special heat-resistant aluminum, further improving the temperature stability of the system. Overall, NS Sirocco 5000 is a highly advanced wafer processing unit suitable for a wide range of industrial and scientific applications. The machine is composed of several components, all of which work together to accurately and precisely process wafers with improved repeatability. The tool offers advanced temperature control, and can handle up to 600°C for precise and consistent processing results. Meanwhile, the use of wafer trays provides efficient and safe wafer transfer throughout the asset.