Used MARCH iTrak #9087090 for sale

MARCH iTrak is an advanced wafer processing equipment designed to meet the demands of research and production environments. It provides the flexibility and scalability to tackle the toughest thin- and thick-film processes. The system is designed around a centralized RF/DC multi-directional platform that enables both standardized and advanced thin-film processes to be created and maintained with the same high level of control. Substrate movement is enabled with a precision multi-axis motion unit that ensures accuracy and repeatability when transferring substrates between various processing stations. Each station has independent vacuum control to allow sequential etches or deposit processes under different vacuum conditions. An RF generator is included to process complex deposition layers or lift-off layers. This generator allows for the precise adjustment of RF power, frequency, and duty cycle. ITrak also includes an advanced temperature control machine to ensure appropriate curing of deposited material. MARCH iTrak also features a floating-bed hydrofluorocarbon track processing chamber complete with a PFEC (photofluorochromic) sensing tool. This chamber ensures accurate exposure to OClVOMe for the deposition of substrates to the OClV-MASPR substrate. ITrak is highly customizable with a wide range of add-on modules, such as the OClV-MASPR substrate RF module, an advanced process control module, and a thermal wave monitor and separate heater module. Additional specialized modules enable unique applications such as x-ray patterning, event wafer alignment, and laser tracer techniques. The asset also enables process monitoring and reporting with a comprehensive software package. This software collects data from multiple points in the model, including the temperature control and RF modules. This allows the user to view the entire process at once, making it easier to diagnose problems and uncover areas of improvement. In summary, MARCH iTrak provides the flexibility and scalability required by modern research and production environments. Its centralized RF/DC platform provides efficient transfer of substrates, while its advanced temperature and RF compensation allow for the deposition of complex layers or lift-off layers with precision and accuracy. The equipment also supports unique applications such as x-ray patterning and laser tracing, as well as process monitoring and reporting capabilities.