Used MKS ASTeX FI20620-1 #9165070 for sale

MKS FI 20620-1 is an advanced wafer processing equipment designed for use in wet chemical processes in the semiconductor industry. The system features a unique flow-in-place (FIP) design for processing multiple wafers simultaneously. This allows for increased throughput and decreased cycle time compared to traditional single-wafer processing systems. The unit can accommodate up to 15 wafers at a time depending on the specific application requirements. The machine consists of a process tank, a transfer arm, a dispense unit, a controller, power supplies, and a filter/regulator. The process tank is made of high-quality stainless steel and is sealed to facilitate efficient process cycles. Inside the tank are a series of individual chambers with channels connecting them. The transfer arm is used to move the wafers from one chamber to the next. The dispense unit is used to accurately and precisely dispense the desired chemicals to the exact location in the process tank for processing. The controller is the tool's "brain" and is responsible for coordinating the motion of the transfer arm, the temperature of the process tank, the process chemistry, and the vacuum pressure. This ensures that the processes are performed accurately and with the utmost repeatability. The controller can also be used to monitor the progress of the processes, allowing for greater consistency in the results. MKS FI20620-1 also features advanced power supply units that provide reliable voltage and current to the asset. This ensures that the processes are performed effectively and with high consistency. The filter/regulator is also an important component as it helps to ensure that the correct gases, temperatures, pressures, and vacuum levels are achieved during processing for maximum reliability. FI 20620-1 is a highly advanced wafer processing model designed for use in wet chemical processes in the semiconductor industry. It features a unique FIP design for increased throughput, high accuracy, and repeatability, and is capable of handling up to 15 wafers at a time. It also features advanced power supplies and a filter/regulator for reliable voltage and current to the equipment, as well as ensuring the correct gases, temperatures, pressures, and vacuum levels are achieved. The system is a powerful and efficient tool for a variety of semiconductor processes.