Used PVA TEPLA / GEMETEC / HOLOGENIX WSPS-3 #9257414 for sale

PVA TEPLA / GEMETEC / HOLOGENIX WSPS-3 wafer processing equipment is an advanced industrial tool designed to support the full range of microelectronic device fabrication processes. It features an integrated robotics system and full range of advanced process control technologies with an excellent library of process recipes. This unit is optimized for efficient, precise and repeatable production of complex electronic and photonics devices. The machine includes an integrated 3-axis robotic handling unit that can move 180mm wafer and pattern transfer/deposition substages with precise motion control and precise wafer location/orientation. It also offers three chambers and a matching wafer transfer chamber, allowing for precise temperature, pressure or vacuum control. The tool has an intuitive user interface and powerful programming & data acquisition software packages for easy setup of process recipes for mask alignment, deposition, oxidation etch, resist development, wet and dry cleaning, laser patterning and integration of additional defined process sequences. The integrated control asset is designed to guarantee precise process control and repeatable results, which ensures maximum performance and yields. It allows for full automation of deposition, alignment and optical etching, as well as mask making. It has up to 48 single or twin-pulse processes, variable frequency control over multiple chambers, variable time control functions and particle filtration. Its laser lithography capabilities include Gen2 laser patterning, alternating laser patterning and low k dielectric etching. This model also offers advanced process monitoring capabilities through a visual inspection equipment. GEMETEC WSPS-3 also has excellent safety features, such as a safety harness, emergency stop buttons on all process modules and machine components. It meets high requirements of accuracy with certain features like low-voltage operations, minimal heat output and high levels of performance. It has excellent thermal management system for improved heat distribution and improved layer uniformity. The unit is also compatible with automated measurement instruments, making it a great choice for complex wafer processing.