Used SATISLOH ART Blocker A #293672033 for sale

ID: 293672033
Blocker.
SATISLOH ART Blocker A is an advanced other wafer processing equipment used for the manufacturing of photomasks, reticles, and other device components for semiconductors. Equipped with an automated cathode heating stage, the system is capable of performing a variety of mask and reticle fabrication processes, such as mask realignment, pattern reclamation, phase shift reticle correction, and laser repair. The unit employs an advanced thermal imaging machine for accurate realignment of masks and reticles. This tool allows for the monitor and mapping of the thermal expansion of complex optical elements, ensuring that the wafer is always accurately positioned. ART Blocker A is equipped with a high performance laser repair asset for repairing high-density photomasks with pinpoint accuracy and minimal working time. The model includes an advanced laser spot alignment equipment to accurately identify the exact location of the damage and the exact position required for repair. The laser spot alignment system is capable of delivering a precise laser repair with an elimination time of less than 10 ms per beam. The unit includes an advanced cleaning machine to ensure that the wafer remains clean throughout the processing. This cleaning tool is designed to reduce the amount of dust and also to reduce the particle contaminants that can accumulate on the wafer. The asset also includes an advanced deposition model that deposits a film on the surface of the wafer. This deposition equipment utilizes a sealed vacuum process to apply a thin, uniform film on the wafer. SATISLOH ART Blocker A is also equipped with an advanced lithography system for performing a variety of complex photomask and wafer operations. The lithography unit utilizes an advanced photoelectric machine that is able to accurately identify the dimensions of various photomasks and components within a single exposure. The tool is also capable of printing patterns on the surface of the wafer, making it possible to create intricate and precise patterns with fast and efficient results. ART Blocker A is one of the most advanced systems available for other wafer processing and mask fabrication. Utilizing its advanced automation features, this asset offers an integrated and comprehensive solution for mask and device fabrication technology. The model offers a variety of features and options that enable the user to optimize their production process and reduce the time and investment required to produce high quality photomasks and reticles.
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