Used SIMCO CR 2000 #293616117 for sale

SIMCO CR 2000 is an advanced wafer processing equipment that is used to incubate and etch wafers through two different processes: thermal oxide and chemical oxide removal. This system offers maximum process control and high throughput, making it a great choice for applications involving ultra-precision processing. CR 2000 features a carousel technique in which wafers are automatically placed on a pallet and moved from station to station through a robotic arm. The machine features a temperature-controlled quartz tube that is used for thermal oxide etching. This machine has the capability for clean oxidation by maintaining a stable temperature, preventing undesirable reactions between oxidation agents. The chemical oxide removal unit of SIMCO CR 2000 utilizes an advanced bath environment to ensure consistent cleanliness and safe processing of the wafers. The bath uses a high-grade surfactant to remove organic and non-organic contaminants while keeping the wafers free from corrosive damage. The effective handling of fumes and emission generated in the bath can also be monitored and managed, providing a safe working environment. This machine also features an advanced Data Acquisition (DAQ) module which is capable of automatically capturing the process data of each step in the process. This DAQ tool is capable of storing, displaying, and analyzing parameters such as pressures, temperatures, and bath concentration values. This data can be used for predictive maintenance and process optimization. Finally, CR 2000 also features a simplified design that provides optimized reliability. Its spindle layout is used to reduce vibration and minimize vibrations, enabling higher wafer throughput. Its highly automated process control asset provides consistent and uniform etching at high speeds, reducing labor costs and increasing productivity.