Used XEI SCIENTIFIC Evactron 10 #9282963 for sale

XEI SCIENTIFIC Evactron 10 is a versatile, precision wafer processing equipment for specialty applications. It utilizes an advanced electron beam plasma-driven cleaning technology that leaves ultra-clean and particle-free wafer surfaces. With production capacity up to 200mm in diameter, this efficient system offers the utmost in wafer cleaning performance. Evactron 10 employs a powerful electron beam source to generate highly reactive ionized argon particles that pass through a series of two-stage filters, resulting in a dry, plasma-based cleaning process. When exposed to the electron beam, the particles form a charged mixture of argon ion clusters and non-ionic particulates that act as cleaning agents, penetrating and removing contamination from the surfaces of wafers without physical contact. Typical contaminants include oxides, nitrides, carbides, and photoresist residues. XEI SCIENTIFIC Evactron 10 offers easy operation and simple maintenance. Its user-friendly interface allows for quick set-up of operating parameters, and the unit is designed to minimize downtime for maintenance. It can be configured with a variety of chamber, nozzle, and source combinations, allowing users to customize the machine for optimum performance with their application. In addition to standard wafer cleaning, Evactron 10 can be used for additional process steps such as wafer texturing and etching. Its high speed and small footprint make it an ideal choice for a variety of wafer processing tasks. XEI SCIENTIFIC Evactron 10 tool is highly reliable, built to comply with current standards of safety and clean room compatibility. It is designed to meet high-volume production requirements for uniform, defect-free results. With its advanced technology, robust construction, and cost-effective design, Evactron 10 from XEI SCIENTIFIC is an ideal choice for specialty cleaning applications.