Used VISION SEMICON VSP-88H #9290575 for sale

VISION SEMICON VSP-88H is a high-temperature sputter deposition oven designed for advanced physical vapor deposition (PVD) processes. It is an advanced furnace capable of temperatures up to 1000°C and capable of depositing thin films of materials. VSP-88H is well suited for thin film deposition of gold, silver, copper, and other noble metals as well as for deposition of wide variety of materials for many applications in the semiconductor industry. The VSP-88 has a cylindrical stainless steel housing with a solid stainless steel work chamber which is fabricated using arc-welding technology for uniform heating. It is equipped with an electrically powered lifting platform to hold targets up to 8" in diameter with a maximum target weight of 13 lbs. The furnace also features an automated controller for precise temperature control of the chamber. With its heated baseplate, VISION SEMICON VSP-88H is also suitable for heating and controlling substrates up to 10" in diameter on the lift platform. This controlled environment allows for height, tilt, and rotation adjustment for precise target to substrate alignment. The VSP-88 features an intuitive touch-screen interface that allows for control of the temperature range, sputter power, gas flow rate, substrate jigsaw, sputter process time, and other process parameters. The controller is also equipped with an alarm function for over-temperature and low-temperature alerts, and a built-in thermal safety interlock to protect against hazardous conditions. The oven is equipped with a diaphragm vacuum pump, which is capable of maintaining pressure levels below 5 x 10-3 Torr and is adjustable from the console. Additionally, it is outfitted with a high frequency floating power supply, enabling gold, silver, and copper sputtering onto substrates with a uniform, high-quality film. Overall, VSP-88H is a technologically advanced high-temperature sputtering deposition oven designed to provide reliable and consistent deposition of thin films on a variety of material substrates. With its wide temperature range and advanced control features, it is an effective tool for performing repeatable and accurate thin film PVD processes.