Used KLA / TENCOR SP1-DLS #9226889 for sale

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ID: 9226889
Particle counter Process: Surface scan (2) Load ports with FOUP capable RFID Type: Load ports carrier reader Robot: ASYST Blower Light source: Argon ion laser Power: 30 mW Wavelength: 488 nm Resolution: 65 nm Function: (4) Dark field collections: Normal wide Normal narrow Oblique wide Oblique narrow Special functions: MAP to MAP RTDC (Real time defect classification).
KLA / TENCOR SP1-DLS is a mask & wafer inspection equipment designed to provide superior image quality and accuracy. It leverages advanced optics, lighting, and software technologies to provide highly detailed defect characterization, advanced automation, and great ease of use. The system features a custom detector design providing greater than 6 megapixel resolution, allowing for increased accuracy in detecting patterning and contamination defects. The optics unit allows for multiple objective lenses allowing users to select different fields of view and magnifications. The machine has a reconfigurable lighting module that can be setup to create bright or dark field image contrast depending on what defect information users need to check for in the image. The light allows for inspection of complex scattering layers and can detect razor-thin lines and miniscule, even hidden defects. The tool has a full suite of proprietary measurement and defect detection algorithms. The advanced software includes an auto-tuning feature that reduces the need for algorithm parameter adjustments. As a result, the asset can be quickly and easily setup to automatically detect and characterize defects as small as six nanometers in size. Additionally, the algorithm processing speed is several times faster than previous generations of wafer inspection systems, providing quick and reliable results at a more competitive price. To ensure accurate inspection results, KLA SP1 DLS features a validated, traceable calibration model. The equipment uses independent reference wafers to measure and correct non-ideal machine performance or environmental changes. This ensures that reconfiguration of the system is kept to a minimum and that results are within specified process standards. The unit has an easy-to-use Graphical User Interface (GUI). The GUI allows users quick access to all inspection setup options and pertinent data. An intuitive selection of tools and reporting features can quickly guide the user to the relevant data. To sum up, TENCOR SP 1-DLS is a reliable and powerful wafer inspection machine which offers superior image quality, increased accuracy, and easy setup. With custom detector design, advanced optics, and a full suite of proprietary algorithms, users can be confident that the tool will provide accurate and efficient results.
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