Used HUETTINGER TruPlasma RF 1003 #293642785 for sale

HUETTINGER TruPlasma RF 1003
ID: 293642785
Power supply.
HUETTINGER TruPlasma RF 1003 is a high-performance power supply specifically designed for industrial plasma applications. This power supply is capable of providing a wide variety of plasma processes, enabling the user to select and adjust the most suitable settings for their specific needs. The RF 1003 is a reliable and economical solution for applications ranging from low-pressure plasma etching and etching in deep trenches to high-pressure etching for functionalization of surfaces. With its three independent outputs, each with a maximum current of 4,000 A and a maximum voltage of 50 V, TruPlasma RF 1003 is ideally suited for demanding plasma processes. The three outputs can be synchronized in the field or factory to optimize results with perfect phase angle settings. The ultra-low inductance design of the RF 1003, along with its high output current density, makes it suitable for high-speed plasma etching. HUETTINGER TruPlasma RF 1003 is equipped with a high-resolution touch screen interface for control and monitoring of the power supply. For precise process setting and adjustment, the user can choose from preset settings or adjust the settings manually. The user also has the option to store up to 500 settings as favorites, allowing for easy access to optimized process parameters. In addition, the RF 1003 features an extensive monitoring system which monitors the real-time status of the power supply. This includes information on the input voltage, current, frequency, temperature, output voltage and current, and other settings. With its overcurrent and overtemperature protection, the RF 1003 ensures safe and reliable operation. Thanks to its rugged, easy-to-use design, TruPlasma RF 1003 is an ideal choice for industrial plasma processing applications. With its high-performance capabilities and comprehensive monitoring system, it enables users to select and adjust the exact settings they need for optimal process results.
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